Founded in Japan in 1950, Fujimi Incorporated is a global leader in precision surface finishing materials. The company specializes in developing advanced CMP slurries, synthetic diamond abrasives, and ultra-fine polishing compounds engineered for sub-micron surface accuracy in high-tech manufacturing.
Key Product Lines & Solutions:
- CMP Slurries: Industry-standard slurries engineered for semiconductor manufacturing, planarizing silicon wafers, metal interconnects, and dielectric films.
- Precision Silicon Wafer Polishing Compounds: Formulated for high stock removal and smooth surface finishing on single-crystal silicon substrates.
- Precision Abrasive Powders: Micro-sized alumina, silicon carbide, and diamond powders designed for optical lenses, ceramics, and hard disk substrates.
- Thermal Spray Powders: High-purity ceramics and metallic powders engineered for protective industrial coatings and wear resistance.
Fujimi delivers high-purity, highly reproducible surface polishing technologies trusted by semiconductor fabs, optical manufacturers, and material processing facilities worldwide.
Brand summary
Fujimi Incorporated is a Japanese multinational manufacturer specializing in precision abrasives and polishing materials. Primary offerings include CMP (Chemical Mechanical Planarization) slurries for semiconductor wafer manufacturing, micro-abrasive powders (alumina, silicon carbide, diamond) for optical and ceramic processing, and thermal spray powders engineered for high-accuracy surface finishing and industrial coatings.
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